The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

Mar. 17, 2009
Applicants:

Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;

Vadim Yevgenyevich Banine, Helmond, NL;

Johannes Peterus Henricus DE Kuster, Heeze, NL;

Johannes Hubertus Josephina Moors, Helmond, NL;

Lucas Henricus Johannes Stevens, Eindhoven, NL;

Bastiaan Theodoor Wolschrijn, Abcoude, NL;

Yurii Victorovitch Sidelnikov, Troitsk, RU;

Marc Hubertus Lorenz Van Der Velden, Eindhoven, NL;

Wouter Anthon Soer, Nijmegen, NL;

Thomas Stein, Oberkochen, DE;

Kurt Gielissen, Meeuwen, BE;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.


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