The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 19, 2011

Filed:

Dec. 06, 2010
Applicants:

Xian Liu, Sunnyvale, CA (US);

Amitay Levi, Cupertino, CA (US);

Alexander Kotov, Sunnyvale, CA (US);

Yuri Tkachev, Sunnyvale, CA (US);

Viktor Markov, Sunnyvale, CA (US);

James Yingbo Jia, Fremont, CA (US);

Chien-sheng Su, Saratoga, CA (US);

Yaw Wen HU, Cupertino, CA (US);

Inventors:

Xian Liu, Sunnyvale, CA (US);

Amitay Levi, Cupertino, CA (US);

Alexander Kotov, Sunnyvale, CA (US);

Yuri Tkachev, Sunnyvale, CA (US);

Viktor Markov, Sunnyvale, CA (US);

James Yingbo Jia, Fremont, CA (US);

Chien-Sheng Su, Saratoga, CA (US);

Yaw Wen Hu, Cupertino, CA (US);

Assignee:

Silicon Storage Technology, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved split gate non-volatile memory cell is made in a substantially single crystalline substrate of a first conductivity type, having a first region of a second conductivity type, a second region of the second conductivity type, with a channel region between the first region and the second region in the substrate. The cell has a select gate above a portion of the channel region, a floating gate over another portion of the channel region, a control gate above the floating gate and an erase gate adjacent to the floating gate. The erase gate has an overhang extending over the floating gate. The ratio of the dimension of the overhang to the dimension of the vertical separation between the floating gate and the erase gate is between approximately 1.0 and 2.5, which improves erase efficiency.


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