The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Jul. 11, 2008
Dale R. Du Bois, Los Gatos, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Mark A. Fodor, Los Gatos, CA (US);
Chiu Chan, Foster City, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Dale R. Du Bois, Los Gatos, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Mark A. Fodor, Los Gatos, CA (US);
Chiu Chan, Foster City, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention comprises an apparatus and method for centering a substrate in a process chamber. In one embodiment, the apparatus comprises a substrate support having a support surface adapted to receive the placement of a substrate and a reference axis substantially perpendicular to the support surface, and a plurality of centering members extending above the support surface. Each centering member is biased into a first position and is movable to a second position by interacting with an opposing member. A movement between the first position and the second position thereby causes each centering member to releasably engage with a peripheral edge of the substrate to push the substrate in a direction toward the reference axis.