The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2011

Filed:

Mar. 26, 2007
Applicants:

Yasuhiko Saijo, Fujisawa, JP;

Keisuke Hayabusa, Fujisawa, JP;

Masanori Hayase, Tokyo, JP;

Yuya Touke, Tokyo, JP;

Inventors:

Yasuhiko Saijo, Fujisawa, JP;

Keisuke Hayabusa, Fujisawa, JP;

Masanori Hayase, Tokyo, JP;

Yuya Touke, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate plating method makes it possible to plate a metal, such as copper or a copper alloy, uniformly into fine recesses in a substrate without forming voids in the metal-filled recesses. The substrate plating method for filling a metal into fine recesses in a surface to be plated of a substrate includes carrying out first plating on the surface to be plated in a plating solution containing a plating accelerator as an additive, carrying out plating accelerator removal processing by bringing a remover, having the property of removing or decreasing the plating accelerator adsorbed on the plating surface, into contact with the plating surface, and then carrying out second plating on the plating surface at a constant electric potential.


Find Patent Forward Citations

Saijo, Yasuhiko. (2011). Substrate plating method and apparatus (U.S. Patent No. 7918983). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7918983

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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