The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2011
Filed:
Aug. 28, 2008
Ken Kitaoka, Kudamatsu, JP;
Masamichi Sakaguchi, Kudamatsu, JP;
Kazue Takahasi, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a vacuum processing apparatus having a function for removing particles on the surface of the sample stage in order to improve the yield of the sample being processed. The vacuum processing apparatus comprises a processing chamberdisposed in a vacuum reactor and having plasma formed in the interior thereof, a sample stageplaced below the processing chamberand having a sampleto be processed placed on the upper plane thereof for processing, and a gas introducing mechanism placed at an upper portion of the processing chamberand having introduction holes for introducing processing gas into the processing chamber, wherein the sample stagecomprises groovesand a gas supply portfor introducing thermal conductance gasbetween the sample stage and the sampleto be processed, and a mechanism for introducing dust removal gasthrough the gas supply portbetween the sample stageand the sampleto be processed or a dummy samplehaving substantially the same shape as the sample to be processed placed on the sample stagewithin the vacuum reactor, by which particlesattached to the sample stageare removed via hydrodynamic force by the dust removal gas