The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2011
Filed:
Jul. 31, 2006
Applicant:
Weimin LI, Boise, ID (US);
Inventor:
Weimin Li, Boise, ID (US);
Assignee:
Mosaid Technologies Incorporated, Ottawa, CA;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 8/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for growing films on substrates using sequentially pulsed precursors and reactants, system and devices for performing the method, semiconductor devices so produced, and machine readable media containing the method.
Li, Weimin. (2011). Sequential pulse deposition (U.S. Patent No. 7910177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7910177
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile