The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Oct. 05, 2005
Hironobu Miya, Toyama, JP;
Taketoshi Sato, Toyama, JP;
Norikazu Mizuno, Toyama, JP;
Masanori Sakai, Takaoka, JP;
Takaaki Noda, Toyama, JP;
Hironobu Miya, Toyama, JP;
Taketoshi Sato, Toyama, JP;
Norikazu Mizuno, Toyama, JP;
Masanori Sakai, Takaoka, JP;
Takaaki Noda, Toyama, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
Disclosed is a substrate processing apparatus, comprising a processing chamber, a holder to hold at least a plurality of product substrates, a heating member, a supplying member to alternately supply at least a first reactant and a second reactant, and a control unit, wherein the control unit executes forming thin films on the substrates by supplying the first reactant, removing a surplus of the first reactant after the first reactant has been adsorbed on the product substrates, subsequently supplying the second reactant, to cause the second reactant to react with the first reactant adsorbed on the substrates, and executes the forming the thin films in a state where a number of the product substrates is insufficient when a number of the product substrates is less than a maximum number of the product substrates which can be held by the holder.