The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
May. 01, 2008
Uwe Griebenow, Markkleeberg, DE;
Martin Mazur, Pulsnitz, DE;
Wolfram Grundke, Dresden, DE;
Andre Poock, Malschwitz, DE;
Uwe Griebenow, Markkleeberg, DE;
Martin Mazur, Pulsnitz, DE;
Wolfram Grundke, Dresden, DE;
Andre Poock, Malschwitz, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Mask defects, such as crystal growth defects and the like, may be efficiently detected and estimated at an early stage of their development by generating test images of the mask under consideration and inspecting the images on the basis of wafer inspection techniques in order to identify repeatedly occurring defects. In some illustrative embodiments, the exposure process for generating the mask images may be performed on the basis of different exposure parameters, such as exposure doses, in order to enhance the probability of detecting defects and also estimating the effect thereof depending on the varying exposure parameters. Consequently, increased reliability may be achieved compared to conventional direct mask inspection techniques.