The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Nov. 09, 2007
C. David Baer, Albuquerque, NM (US);
Daniel R. Neal, Tijeras, NM (US);
Richard James Copland, Albuquerque, NM (US);
David Austin Neal, Albuquerque, NM (US);
C. David Baer, Albuquerque, NM (US);
Daniel R. Neal, Tijeras, NM (US);
Richard James Copland, Albuquerque, NM (US);
David Austin Neal, Albuquerque, NM (US);
AMO Wavefront Sciences LLC., Santa Ana, CA (US);
Abstract
Systems and methods for measuring a distance from a reference plane of an optical measurement instrument to a reference plane of an optical device under test are disclose. In one embodiment a system for measuring this distance includes an illumination system, an optical system, and optical sensor and a processor. The illumination system is configured or adapted to illuminate the object under test. The optical system is configured or adapted to receive light from the object under test and to produce an aberrated image. The optical sensor is configured or adapted to receive and sense the aberrated image. The processor determines the distance from the reference plane of the optical measurement instrument to the reference plane of the optical device based on an aspect of the aberrated image sensed by the optical sensor.