The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2011

Filed:

Aug. 08, 2007
Applicants:

Vladimir Vitalevich Ivanov, Moscow, RU;

Vadim Yevgenyevich Banine, Helmond, NL;

Arno Jan Bleeker, Westerhoven, NL;

Konstantin Nikolaevich Koshelev, Troitsk, RU;

Pavel Stanislavovich Antsiferov, Troitsk, RU;

Vladimir Mihailovitch Krivtsun, Troitsk, RU;

Dmitriy Victorovich Lopaev, Tekstilchik, RU;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/00 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
Abstract

A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.


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