The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2011
Filed:
May. 13, 2009
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Wouter Anthon Soer, Nijmegen, NL;
Johannes Christiaan Leonardus Franken, Knegsel, NL;
Olav Waldemar Vladimir Frijns, 's-Hertogenbosch, NL;
Niels Machiel Driessen, Valkenswaard, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Wouter Anthon Soer, Nijmegen, NL;
Johannes Christiaan Leonardus Franken, Knegsel, NL;
Olav Waldemar Vladimir Frijns, 's-Hertogenbosch, NL;
Niels Machiel Driessen, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.