The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2011

Filed:

Oct. 28, 2008
Applicants:

Ruriko Tsuneta, Fuchu, JP;

Hideki Kikuchi, Hitachinaka, JP;

Takafumi Yotsuji, Hitachinaka, JP;

Toshie Yaguchi, Omitama, JP;

Inventors:

Ruriko Tsuneta, Fuchu, JP;

Hideki Kikuchi, Hitachinaka, JP;

Takafumi Yotsuji, Hitachinaka, JP;

Toshie Yaguchi, Omitama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electric charged particle beam microscope is provided in which a specimen movement due to a specimen rotation is classified into a repeatable movement and a non-repeatable movement, a model of movement is determined for the repeatable movement, a range of movement is determined for the non-repeatable movement, the repeatable movement is corrected on the basis of the movement model through open-loop and the non-repeatable movement is corrected under a condition set on the basis of the range of movement.


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