The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2010

Filed:

Sep. 26, 2008
Applicants:

Tetsuya Ozawa, Hino, JP;

Ryuji Matsuo, Hino, JP;

Go Fujinawa, Hamura, JP;

Akira Echizenya, Fussa, JP;

Inventors:

Tetsuya Ozawa, Hino, JP;

Ryuji Matsuo, Hino, JP;

Go Fujinawa, Hamura, JP;

Akira Echizenya, Fussa, JP;

Assignee:

Rigaku Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/207 (2006.01);
U.S. Cl.
CPC ...
Abstract

An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a generator for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector being disposed to surround that sample around; and a focusing arrangement, being disposed between the sample and the X-ray detector, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and for focusing and irradiating it upon the X-ray detector.


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