The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Mar. 16, 2007
Howard S. Landis, Underhill, VT (US);
David P. Parker, Maricopa, AZ (US);
Jeanne-tania Sucharitaves, Williston, VT (US);
Howard S. Landis, Underhill, VT (US);
David P. Parker, Maricopa, AZ (US);
Jeanne-Tania Sucharitaves, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A mask system for use by a lithographic system to project an image of a circuit design. The design includes at least one large feature and at least one nearby small feature. The mask comprises one or more shapes on a mask to project an image of the nearby small feature and, on the same mask or on a different mask, an opaque shape to project an image of the large feature. The opaque shape includes in a field thereof at least one dummy clear shape of size and configuration insufficient to be resolved. Light from the lithographic projection system may be projected through the opaque shape and the dummy clear shape to resolve an image of the large circuit feature on a resist layer of a wafer without resolving the clear shape on the resist layer, while simultaneously increasing optical flare on the resolved large circuit feature image.