The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2010
Filed:
Nov. 04, 2008
Applicants:
Milind Weling, Pleasanton, CA (US);
Judy Huckabay, Fremont, CA (US);
Abdurrahman Sezginer, Monte Sereno, CA (US);
Inventors:
Milind Weling, Pleasanton, CA (US);
Judy Huckabay, Fremont, CA (US);
Abdurrahman Sezginer, Monte Sereno, CA (US);
Assignee:
Cadence Design Systems, Inc., San Jose, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2006.01); G03F 1/00 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Various embodiments of the invention provide systems and methods for semiconductor device fabrication and generation of photomasks for patterning a target layout of line features and large features. Embodiments of the invention are directed towards systems and methods using self-aligned double pattern to define the target layout of line features and large features.