The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
May. 28, 2008
Tomonori Shin, Koshi, JP;
Kouji Okamura, Koshi, JP;
Tomohiro Kaneko, Koshi, JP;
Akira Miyata, Koshi, JP;
Syuzo Fujimaru, Koshi, JP;
Tomonori Shin, Koshi, JP;
Kouji Okamura, Koshi, JP;
Tomohiro Kaneko, Koshi, JP;
Akira Miyata, Koshi, JP;
Syuzo Fujimaru, Koshi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called 'scheduled transfer' from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate.