The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Mar. 24, 2008
John M. Cotte, New Fairfield, CT (US);
Balasubramanian Haran, Watervliet, NY (US);
Christopher C. Parks, Poughkeepsie, NY (US);
Xiaoyan Shao, Yorktown Heights, NY (US);
Eva E. Simonyi, Bronx, NY (US);
John M. Cotte, New Fairfield, CT (US);
Balasubramanian Haran, Watervliet, NY (US);
Christopher C. Parks, Poughkeepsie, NY (US);
Xiaoyan Shao, Yorktown Heights, NY (US);
Eva E. Simonyi, Bronx, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present disclosure relates to a microelectronic structure and the manufacture of the microelectronic structure. Specifically, the disclosure relates to an interconnect barrier layer between a rhodium contact structure and a copper interconnect structure in a microelectronic structure. The microelectronic structure provides for low resistance in microelectronic devices.