The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2010
Filed:
Sep. 02, 2008
Masatoshi Miyake, Kamakura, JP;
Kenji Maeda, Koganei, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Masaru Izawa, Hino, JP;
Masatoshi Miyake, Kamakura, JP;
Kenji Maeda, Koganei, JP;
Kenetsu Yokogawa, Tsurugashima, JP;
Masaru Izawa, Hino, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A plasma processing method includes etching an insulating film of a sample to be processed using plasma generated from etching gas, supplying a large flow of inert gas from above the sample while having the sample mounted on a sample mounting stage, supplying deposit removal gas to only an area near a side wall of a processing chamber, and controlling a plasma density distribution to thereby vary a plasma density at a center area of the processing chamber and a plasma density at an area near the side wall of the processing chamber so as to perform a deposited film removing process for removing the film deposited on the side wall of the processing chamber.