The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2010

Filed:

Mar. 05, 2010
Applicants:

Alexander Straaijer, Eindhoven, NL;

Ronald Franciscus Herman Hugers, Eindhoven, NL;

Inventors:

Alexander Straaijer, Eindhoven, NL;

Ronald Franciscus Herman Hugers, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.


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Straaijer, Alexander. (2010). Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method (U.S. Patent No. 7839506). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7839506

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