The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Jul. 07, 2006
Vincent Chang, Hsin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
George Liu, Hsin-Chu, TW;
Norman Chen, Hsin-Chu, TW;
Vincent Chang, Hsin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
George Liu, Hsin-Chu, TW;
Norman Chen, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Photolithography processing methods by which a photoresist layer is deposited, a portion of the photoresist layer is exposed to electromagnetic radiation to transfer a reticle pattern thereto, and the exposed portion of the photoresist layer is treated with thermal energy while being subjected to an electric field, wherein the electric field is configured to substantially limit diffusion of the exposed photoresist layer portion to anisotropic diffusion.