The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Mar. 25, 2005
Takayuki Toshima, Koshi, JP;
Naoki Shindo, Nirasaki, JP;
Hiroshi Yano, Tokyo, JP;
Kotaro Tsurusaki, Tosu, JP;
Takayuki Toshima, Koshi, JP;
Naoki Shindo, Nirasaki, JP;
Hiroshi Yano, Tokyo, JP;
Kotaro Tsurusaki, Tosu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing systemcomprises: a processing tankfor processing substrates W with a processing liquid; a drying unitdisposed above the processing tank; and a carrying mechanismfor carrying the substrates W between the processing tankand the drying unit. A processing gas supply linefor supplying a processing gas into the drying unitand inert gas supply linesandfor supplying an inert gas into the drying unitare connected to the drying unit. A first discharge line for discharging an atmosphere purged from the drying unitand a second discharge linefor forcibly exhausting the drying unitare connected to the drying unit