The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2010
Filed:
Sep. 13, 2007
Masahiro Hashimoto, Shinjuku-ku, JP;
Tomoyuki Enomoto, Toyama, JP;
Takahiro Sakaguchi, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Masaki Nagai, Chiyoda-ku, JP;
Masahiro Hashimoto, Shinjuku-ku, JP;
Tomoyuki Enomoto, Toyama, JP;
Takahiro Sakaguchi, Toyama, JP;
Rikimaru Sakamoto, Toyama, JP;
Masaki Nagai, Chiyoda-ku, JP;
Hoya Corporation, Tokyo, JP;
Nissin Chemical Industries, Ltd., Tokyo, JP;
Abstract
A mask blank is equipped with a thin film that forms a mask pattern formed on a substrate and a chemically amplified type resist film that is formed above the thin film. In the mask blank, a protective film that prevents movement of a substance that inhibits a chemical amplification function of the resist film from a bottom portion of the resist film to inside the resist film is provided between the thin film and the resist film. The mask blank suppresses the error of the line width dimension of the transfer pattern formed on the substrate to the design dimension of the transfer pattern line width of the transfer mask (actual dimension error) and also suppress linearity up to 10 nm.