The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Sep. 25, 2007
Michael L. Rieger, Skamania, WA (US);
Micheal Cranford, Hillsboro, OR (US);
John P. Stirniman, Vancouver, WA (US);
Michael L. Rieger, Skamania, WA (US);
Micheal Cranford, Hillsboro, OR (US);
John P. Stirniman, Vancouver, WA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
An embodiment of the present invention provides a system that computes the effect of perturbations to a pattern layout during an OPC process. During operation, the system receives a pattern layout and a set of lithography model kernels. The system then obtains a set of convolved patterns by convolving the pattern layout with each of the set of lithography model kernels. The system additionally receives a perturbation pattern to be added onto the pattern layout. Next, for a query location on the pattern layout, the system obtains a set of convolution values at the query location by using model flash lookup tables to convolve the perturbation pattern with the set of lithography model kernels. The system then updates the set of convolved patterns at the query location to account for the effect of the perturbation pattern by combining the set of convolution values with the set of convolved patterns.