The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2010
Filed:
Nov. 21, 2007
Xinyu Zhang, Palo Alto, CA (US);
Feng-hong Zhang, Sunnyvale, CA (US);
Xinyu Zhang, Palo Alto, CA (US);
Feng-Hong Zhang, Sunnyvale, CA (US);
ProMOS Technologies Pte. Ltd., Singapore, SG;
Abstract
A batch of wafers is temporarily stalled during a Double Pattern Technology (DPT) process before a temporary representation of a second of to-be-overlaid patterns is permanently combined with a first of the patterns. Sampled ones of the stalled wafers are inspected to determine if sufficiently close alignment is present between the two patterns. If excessive misalignment is detected (e.g., by SEM microscopy), the second but still temporary pattern representation is erased from all wafers of the batch and the batch is routed for rework and corrected reestablishment of the temporary representation of the second of to-be-overlaid patterns.