The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2010
Filed:
Oct. 24, 2007
Xuedong Liu, Cupertino, CA (US);
Xu Zhang, Hayward, CA (US);
Joe Wang, Campbell, CA (US);
Edward Tseng, Jubei, TW;
Zhongwei Chen, San Jose, CA (US);
Xuedong Liu, Cupertino, CA (US);
Xu Zhang, Hayward, CA (US);
Joe Wang, Campbell, CA (US);
Edward Tseng, Jubei, TW;
Zhongwei Chen, San Jose, CA (US);
Hermes-Microvision, Inc., Hsinchu, TW;
Abstract
System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.