The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2010

Filed:

Mar. 18, 2009
Applicants:

Takeo Yamamoto, Nishikamo-gun, JP;

Takeshi Endo, Obu, JP;

Eiichi Okuno, Mizuho, JP;

Masaki Konishi, Toyota, JP;

Inventors:

Takeo Yamamoto, Nishikamo-gun, JP;

Takeshi Endo, Obu, JP;

Eiichi Okuno, Mizuho, JP;

Masaki Konishi, Toyota, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 21/283 (2006.01); H01L 21/44 (2006.01); H01L 21/441 (2006.01); H01L 31/0312 (2006.01); H01L 29/47 (2006.01);
U.S. Cl.
CPC ...
Abstract

A silicon carbide semiconductor device provided as a semiconductor chip includes a substrate, a drift layer on the substrate, an insulation film on the drift layer, a semiconductor element formed in a cell region of the drift layer, a surface electrode formed on the drift layer and electrically coupled to the semiconductor element through an opening of the insulation film, and a passivation film formed above the drift layer around the periphery of the cell region to cover an outer edge of the surface electrode. The passivation film has an opening through which the surface electrode is exposed outside. A surface of the passivation film is made uneven to increase a length from an inner edge of the opening of the passivation film to a chip edge measured along the surface of the passivation film.


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