The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Jan. 15, 2008
Mark T. Bohr, Aloha, OR (US);
Steven J. Keating, Beaverton, OR (US);
Thomas A. Letson, Beaverton, OR (US);
Anand S. Murthy, Portland, OR (US);
Donald W. O'neill, Portland, OR (US);
Willy Rachmady, Beaverton, OR (US);
Mark T. Bohr, Aloha, OR (US);
Steven J. Keating, Beaverton, OR (US);
Thomas A. Letson, Beaverton, OR (US);
Anand S. Murthy, Portland, OR (US);
Donald W. O'Neill, Portland, OR (US);
Willy Rachmady, Beaverton, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Embodiments are an improved transistor structure and the method of fabricating the structure. In particular, a wet etch of an embodiment forms source and drain regions with an improved tip shape to improve the performance of the transistor by improving control of short channel effects, increasing the saturation current, improving control of the metallurgical gate length, increasing carrier mobility, and decreasing contact resistance at the interface between the source and drain and the silicide.