The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
May. 02, 2006
Tamer Coskun, Cupertino, CA (US);
Sangbong Park, Union City, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Bernd Geh, Scottsdale, AZ (US);
Tamer Coskun, Cupertino, CA (US);
Sangbong Park, Union City, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Bernd Geh, Scottsdale, AZ (US);
ASML MaskTools B.V., Veldhoven, NL;
Abstract
A process of obtaining short-range flare model parameters representing a short-range flare which degrades a contrast of an image generated by a lithography tool, is disclosed. Short-range flare is measured from the image to obtain measured short-range flare data. A simulation is performed based on short-range flare model parameters to obtain simulated short-range flare data. The simulated short-range flare data is compared with the measured short range flare data. It is determined whether the short-range flare model parameters used in the simulation is appropriate based on the comparison result. The short-range flare model parameters is optimized according to the measured short-range data and the simulated short-range flare data if the short-range flare model parameters used for the simulation is not appropriate.