The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Nov. 25, 2004
Masaharu Kawakubo, Kumagaya, JP;
Yuho Kanaya, Kumagaya, JP;
Chiaki Nakagawa, Kumagaya, JP;
Takahisa Kikuchi, Saitama, JP;
Masahiko Akizuki, Fukaya, JP;
Masaharu Kawakubo, Kumagaya, JP;
Yuho Kanaya, Kumagaya, JP;
Chiaki Nakagawa, Kumagaya, JP;
Takahisa Kikuchi, Saitama, JP;
Masahiko Akizuki, Fukaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Positional information (an estimate value in which a linear component of positional deviation amount is corrected) of each shot on a wafer is calculated by a statistical computation using actual measurement values of positional information of a plurality of sample shots on the wafer (step). And, a variation amount of a non-linear component of positional deviation amount is calculated at predetermined intervals with respect to each of a plurality of measurement shots including the sample shots (step), and judgment is made about the necessity of update of correction information based on magnitude of the calculated variation amount of a non-linear component of each measurement shot area (step). Therefore, comparing with the case when actual values of positional information of all shots on the wafer are obtained at least once in each lot in order to update a correction value, the number of shots subject to positional information measurement and the measurement time can be reduced without fail.