The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Dec. 20, 2006
Heok-jae Lee, Suwon-si, KR;
Sang-ho Kim, Yongin-si, KR;
Hyu-rim Park, Suwon-si, KR;
Do-in Bae, Changwon-si, KR;
Kee-weone Seo, Suwon-si, KR;
Chang-woo Woo, Yongin-si, KR;
Heok-Jae Lee, Suwon-si, KR;
Sang-Ho Kim, Yongin-si, KR;
Hyu-Rim Park, Suwon-si, KR;
Do-In Bae, Changwon-si, KR;
Kee-Weone Seo, Suwon-si, KR;
Chang-Woo Woo, Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
Embodiments of the invention provide a wafer aligning apparatus and a wafer aligning method. In one embodiment, the wafer aligning apparatus comprises an imaging unit adapted to take an image of a wafer being transferred from a load lock chamber to a transfer chamber and adapted to convert the image into digital signals, and a signal processing unit adapted to calculate a center alignment correction value for the wafer by comparing the digital signals to a master image stored in the signal processing unit. The wafer aligning apparatus further comprises a robot controller adapted to receive the center alignment correction value from the signal processing unit and adapted to control a transfer robot in accordance with the center alignment correction value to provide the wafer to a process chamber such that the center of the wafer is substantially aligned.