The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Sep. 12, 2007
Bruce W. Balch, Saranac, NY (US);
Jeanne P. Bickford, Essex Junction, VT (US);
Nazmul Habib, South Burlington, VT (US);
Phung T. Nguyen, Pleasant Valley, NY (US);
Bruce W. Balch, Saranac, NY (US);
Jeanne P. Bickford, Essex Junction, VT (US);
Nazmul Habib, South Burlington, VT (US);
Phung T. Nguyen, Pleasant Valley, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Methods of modeling across reticle variations and a related reticle are disclosed. One embodiment of the method includes defining a test for determination across a multiple chip wafer; identifying a measurement structure for performing the test; implementing the measurement structure on the multiple chip wafer using a reticle including the measurement structure between copies of the multiple chips on the reticle, wherein no one of the multiple chips covers an entirety of the reticle; performing the test on the multiple chip wafer using the measurement structure to acquire data across the reticle; using data from the performing to establish an across reticle variation model; and using the across reticle variation model to predict across chip variation for at least one of the multiple chips.