The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Apr. 23, 2007
Kotaro Endo, Kawasaki, JP;
Makiko Irie, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Yoshiyuki Utsumi, Kawasaki, JP;
Yasuhiro Yoshii, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Kotaro Endo, Kawasaki, JP;
Makiko Irie, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Yoshiyuki Utsumi, Kawasaki, JP;
Yasuhiro Yoshii, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Tokyo Ohka Co., Ltd., Kawasaki-shi, JP;
Abstract
A positive resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits increased alkali solubility under the action of acid; and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) includes a cyclic main chain resin (A1) containing a fluorine atom and no acid-dissociable group, and a resin (A2) containing a structural unit (a) derived from an acrylic acid and no fluorine atom.