The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Oct. 26, 2007
Son T. Nguyen, San Jose, CA (US);
Kedarnath Sangam, Sunnyvale, CA (US);
Miriam Schwartz, Los Gatos, CA (US);
Kenric Choi, Santa Clara, CA (US);
Sanjay Bhat, Bangalore, IN;
Pravin K. Narwankar, Sunnyvale, CA (US);
Shreyas Kher, Campbell, CA (US);
Rahul Sharangapani, Fremont, CA (US);
Shankar Muthukrishnan, San Jose, CA (US);
Paul Deaton, San Jose, CA (US);
Son T. Nguyen, San Jose, CA (US);
Kedarnath Sangam, Sunnyvale, CA (US);
Miriam Schwartz, Los Gatos, CA (US);
Kenric Choi, Santa Clara, CA (US);
Sanjay Bhat, Bangalore, IN;
Pravin K. Narwankar, Sunnyvale, CA (US);
Shreyas Kher, Campbell, CA (US);
Rahul Sharangapani, Fremont, CA (US);
Shankar Muthukrishnan, San Jose, CA (US);
Paul Deaton, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.