The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Apr. 25, 2007
Applicants:
Feng-ning Lee, Longtan Shiang, TW;
Yung-cheng Chen, Jhubei, TW;
Yao-hwan Kao, Hsinchu County, TW;
Li-jen Ko, Zhuebi, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Inventors:
Feng-Ning Lee, Longtan Shiang, TW;
Yung-Cheng Chen, Jhubei, TW;
Yao-Hwan Kao, Hsinchu County, TW;
Li-Jen Ko, Zhuebi, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01); G03B 27/32 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control the exposure module and the baking module.