The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Jul. 24, 2008
Applicants:
Yukiharu Takeuchi, Nagano, JP;
Hideaki Sakaguchi, Nagano, JP;
Inventors:
Yukiharu Takeuchi, Nagano, JP;
Hideaki Sakaguchi, Nagano, JP;
Assignee:
Shinko Electric Industries Co., Ltd., Nagani-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01C 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate and mask aligning apparatus includes a controlling portionfor calculating moving data that are applied to eliminate a difference between a present superposed state of the through holesof the mask, which comes into contact with the substratethat is loaded on the stage, on the padsof the substrateand a scheduled superposed state on the basis of image data from the shooting sectionand then executing repeatedly an operation to move the stageon the basis of the calculated moving data of the stage.