The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Feb. 16, 2006
Raschid J. Bezama, Putnam Valley, NY (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
Xiao H. Liu, Briarcliff Manor, NY (US);
Dmitriy Shneyder, Hopewell Junction, NY (US);
Raschid J. Bezama, Putnam Valley, NY (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
Xiao H. Liu, Briarcliff Manor, NY (US);
Dmitriy Shneyder, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus for reducing contamination in immersion lithography includes a wafer chuck assembly including a wafer chuck configured to hold a semiconductor wafer on a support surface thereof. An O-ring assembly has a deformable O-ring attached to movable support sections arranged in a generally circular configuration so as to surround the wafer.