The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Aug. 27, 2004
Hans Koops, Ober-Ramstadt, DE;
Klaus Edinger, Heppenheim, DE;
Sergey Babin, Castro Valley, CA (US);
Thorsten Hofmann, Rodgau, DE;
Petra Spies, Mainz, DE;
Hans Koops, Ober-Ramstadt, DE;
Klaus Edinger, Heppenheim, DE;
Sergey Babin, Castro Valley, CA (US);
Thorsten Hofmann, Rodgau, DE;
Petra Spies, Mainz, DE;
Nawo Tec GmbH, Rossdorf, DE;
Abstract
A method for etching a chromium layer in a vacuum chamber which may comprise introducing a halogen compound into the vacuum chamber, directing an electron beam onto the area of the chromium layer to be etched and/or introducing an oxygen including compound into the vacuum chamber. A further method for the highly resolved removal of a layer out of metal and/or metal oxide which may be arranged on an isolator or a substrate having poor thermal conductivity, may comprise arranging the layer inside a vacuum chamber, bombarding the layer with a focused electron beam with an energy of 3-30 keV, wherein the electron beam may be guided such that the energy transfer per time and area causes a localized heating of the layer above its melting and/or vaporization point and wherein the removal of the layer may be performed without the supply of reaction gases into the vacuum chamber.