The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
May. 24, 2006
Olaf Conradi, Westhausen/Westerhofen, DE;
Heiko Feldmann, Aalen, DE;
Gerald Richter, Abtsgmuend, DE;
Sascha Bleidistel, Aalen, DE;
Andreas Frommeyer, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Wolfgang Hummel, Aalen, DE;
Olaf Conradi, Westhausen/Westerhofen, DE;
Heiko Feldmann, Aalen, DE;
Gerald Richter, Abtsgmuend, DE;
Sascha Bleidistel, Aalen, DE;
Andreas Frommeyer, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Wolfgang Hummel, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (), wherein the projection objective has a plurality of lenses (L, L, L, L, L, L, L, L) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.