The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Aug. 06, 2007
Noriyuki Kaneoka, Hitachinaka, JP;
Kaoru Umemura, Tokyo, JP;
Koji Ishiguro, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A charged particle beam system, a sample processing method, and a semiconductor inspection system enable an accurate detection of a particle in a film without causing LMIS contamination and allow observation with an electron microscope quickly. A particlecausing a defect in a filmthat has been detected with a separate optical inspection system is detected with an optical microscopebased on position information acquired by the separate optical inspection system. A sampleis processed with a nonmetal ion beamso as to allow observation of the particlewith an electron microscope image or an ion microscope image, or ultimate analysis of the particlewith an EDX.