The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Apr. 02, 2007
Anshuman Cherala, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Ecron D. Thompson, Round Rock, TX (US);
Anshuman Cherala, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Ecron D. Thompson, Round Rock, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.