The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Sep. 21, 2007
Asao Yamashita, Fishkill, NY (US);
Merritt Funk, Austin, TX (US);
Daniel J. Prager, Hopewell Junction, NY (US);
Lee Chen, Cedar Creek, TX (US);
Radha Sundaranajan, Dripping Springs, TX (US);
Asao Yamashita, Fishkill, NY (US);
Merritt Funk, Austin, TX (US);
Daniel J. Prager, Hopewell Junction, NY (US);
Lee Chen, Cedar Creek, TX (US);
Radha Sundaranajan, Dripping Springs, TX (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
The invention can provide a method of processing a substrate using Spacer-Optimization (S-O) processing sequences and evaluation libraries that can include one or more optimized spacer creation and evaluation procedures. In addition, the S-O processing sequences can include one or more deposition procedures, one or more partial-etch procedures, one or more chemical oxide removal (COR)-etch procedures, one or more optimization procedures, one or more evaluation procedures, and/or one or more verification procedures.