The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Jul. 15, 2004
Laurent Karsenti, Rehovot, IL;
Laurent Karsenti, Rehovot, IL;
Applied Materials Israel, Ltd., Rehovot, IL;
Abstract
A morphological operation is applied to an SEM image to obtain a idealized image, and the idealized image is used to detect a defect in a subject of the SEM image. The defect is detected by subtraction of the idealized image from the original image. Morphological operations are used also to entrance the visibility of defects or to check for irregularities in patterns. Other described methods comprise: growing a flow from seed points in the image, in order to define maps in which particles can be identified; checking for separation of objects in the image by growing flows from seed points located on the objects; segmenting the image into supposed identical objects and applying statistical methods to identify the defective ones.