The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Jun. 09, 2008
Ralf Richter, Dresden, DE;
Thorsten Kammler, Ottendorf-Okrilla, DE;
Heike Salz, Dresden, DE;
Volker Grimm, Langebrueck, DE;
Ralf Richter, Dresden, DE;
Thorsten Kammler, Ottendorf-Okrilla, DE;
Heike Salz, Dresden, DE;
Volker Grimm, Langebrueck, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
By forming an etch control material with increased thickness on a first stressed dielectric layer in a dual stress liner approach, the surface topography may be smoothed prior to the deposition of the second stressed dielectric material, thereby allowing the deposition of an increased amount of stressed material while not contributing to yield loss caused by deposition-related defects.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile