The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Jun. 02, 2005
Masaru Takeshita, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Ryotaro Hayashi, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Syogo Matsumaru, Kawasaki, JP;
Satoshi Fujimura, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Ryotaro Hayashi, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Syogo Matsumaru, Kawasaki, JP;
Satoshi Fujimura, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A polymer, a positive resist composition, and a method for forming a resist pattern that are able to form a resist pattern with a high level of resolution and excellent etching resistance. The present invention uses a polymer that contains a structural unit (a1) represented by a general formula (a-1) shown below and a structural unit (a2) represented by a general formula (a-2) shown below, another polymer that contains the structural unit (a1) and a structural unit (a3) represented by a general formula (a-3) shown below, and another polymer that contains the structural unit (a1), the structural unit (a2), and the structural unit (a3).