The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Jun. 18, 2008
Xinkang Tian, San Jose, CA (US);
Manuel Madriaga, San Jose, CA (US);
Ching-ling Meng, Sunnyvale, CA (US);
Mihail Mihaylov, San Jose, CA (US);
Xinkang Tian, San Jose, CA (US);
Manuel Madriaga, San Jose, CA (US);
Ching-Ling Meng, Sunnyvale, CA (US);
Mihail Mihaylov, San Jose, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.