The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Mar. 20, 2006
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Hans Butler, Best, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Bartholomeus Hendricus Koek, Eindhoven, NL;
Frits Van Der Meulen, Eindhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Jozef Petrus Henricus Benschop, Veldhoven, NL;
Hans Butler, Best, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Bartholomeus Hendricus Koek, Eindhoven, NL;
Frits Van Der Meulen, Eindhoven, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.