The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
May. 30, 2008
Zhong-wei Chen, San Jose, CA (US);
Xuedong Liu, Cupertino, CA (US);
Xu Zhang, Hayward, CA (US);
Weiming Ren, San Jose, CA (US);
Juying Dou, San Jose, CA (US);
Zhong-Wei Chen, San Jose, CA (US);
Xuedong Liu, Cupertino, CA (US);
Xu Zhang, Hayward, CA (US);
Weiming Ren, San Jose, CA (US);
Juying Dou, San Jose, CA (US);
Hermes Microvision, Inc., Hsinchu, TW;
Abstract
The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.