The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Aug. 31, 2007
Satoshi Kamiyama, Nagoya, JP;
Motoaki Iwaya, Inazawa, JP;
Hiroshi Amano, Nagoya, JP;
Isamu Akasaki, Nagoya, JP;
Satoshi Kamiyama, Nagoya, JP;
Motoaki Iwaya, Inazawa, JP;
Hiroshi Amano, Nagoya, JP;
Isamu Akasaki, Nagoya, JP;
Meijo University, Nagoya-shi, Aichi-ken, JP;
Abstract
The present invention discloses a two-light flux interference exposure device comprising: a laser light source provided in a laser resonator; a single harmonic generation device provided in the laser resonator for converting laser light output by the laser light source to higher harmonics; an etalon provided in the laser resonator so as to serve as a narrowband wavelength filter; a beam splitter dividing laser light output outside the laser resonator into two light fluxes; and an interference optic system causing the light fluxes to interfere with each other on a target to be exposed.