The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2010
Filed:
May. 31, 2006
Alex Ka Tim Poon, San Ramon, CA (US);
Leonard Wai Fung Kho, San Francisco, CA (US);
Gaurav Keswani, Milpitas, CA (US);
Alex Ka Tim Poon, San Ramon, CA (US);
Leonard Wai Fung Kho, San Francisco, CA (US);
Gaurav Keswani, Milpitas, CA (US);
Nikon Corporation, Tokyo, JP;
Abstract
A apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. A porous member is disposed adjacent to the immersion area. A pressure control system provides a first low pressure to a first portion of the porous member to remove immersion fluid that escapes from the immersion area, and provides a second low pressure to a second portion of the porous member to remove immersion fluid that escapes from the immersion area. The second low pressure is different from the first low pressure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile