The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2010

Filed:

Dec. 22, 2006
Applicants:

Joseph Ferrara, Georgetown, MA (US);

BO H. Vanderberg, Gloucester, MA (US);

Michael A. Graf, Belmont, MA (US);

Inventors:

Joseph Ferrara, Georgetown, MA (US);

Bo H. Vanderberg, Gloucester, MA (US);

Michael A. Graf, Belmont, MA (US);

Assignee:

Axcelis Technologies, Inc., Beverly, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A workpiece or semiconductor wafer is tilted as a ribbon beam is swept up and/or down the workpiece. In so doing, the implant angle or the angle of the ion beam relative to the workpiece remains substantially constant across the wafer. This allows devices to be formed substantially consistently on the wafer. Resolving plates move with the beam as the beam is scanned up and/or down. This allows desired ions to impinge on the wafer, but blocks undesirable contaminants.


Find Patent Forward Citations

Ferrara, Joseph. (2010). System and method for two-dimensional beam scan across a workpiece of an ion implanter (U.S. Patent No. 7750320). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7750320

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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